Curvilinear Mask Optimization for Inverse Lithography Based on B-splines and Constrained Delaunay Triangulation. CSIAM Transactions on Applied Mathematics, [S. l.], 2026. DOI: 10.4208/csiam-am.SO-2025-0032. Disponível em: https://global-sci.com/csiam-am/article/view/23817. Acesso em: 6 apr. 2026.